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SPIE Advanced Lithography 2011

When:
February 12, 2012 - February 16, 2012
Where:
San Jose Convention Center
408 Almaden Blvd.
San Jose, CA, 95110

Description

The chip industry continues to name lithography as a critical challenge in fabricating next generation integrated circuits. Today, lithographers are challenged with extending immersion lithography to physical limits, while striving to bring newer technologies, such as EUV lithography, to production readiness. Success will demand ingenuity, cost efficiency and communication within the lithography community and across interdisciplinary lines.