SPIE Photomask Technology Exhibition 2015

SPIE Photomask Technology, the premier event in the mask-making field
Date
2015-09-29 - 2015-09-30
Organizer
Exhibitors
20
Floor Size
1200
Attendees
400
Event contact first name
.
Event contact last name
Customer Service
Email
customerservice@spie.org
Event contact telephone number
+1 360 676 3290
Description
SPIE Photomask Technology, the premier event in the mask-making field, is co-located with SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Together in a single forum, this event provides access to connections and information while encouraging discussions about current research and new advancements. Featured technologies: + Electron-beam lithography + EUV + Inspection and metrology tools + Direct laser writing + Optical/laser microlithography + Resist technology and processing + Electronic hardware and software + Electronic imaging components AUDIENCE + Engineers and designers + Corporate managers from the industry + Application and product developers + Mask and chip designers + Resist chemists + Quality assurance specialists + Experts in mask infrastructure and mask integration + People working in emerging mask technologies + Microscopists from all phases of scanning microscopies Exhibition Dates and Hours: Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm Wednesday 30 September | 10:00 am to 4:00 pm

Partner Voices

From apps to chatbots to completely redesigned meeting spaces, technology is revolutionizing how events are planned, executed and experienced. It’s now at the core of most successful events and, ultimately, is instrumental in helping attendees forge meaningful connections and gain insight. The opportunities to create truly impactful experiences will only increase with the rise of “all-in-one” tech tools and the introduction of 5G internet.