SPIE Photomask Technology, the premier event in the mask-making field
Event Dates
2015-09-29 - 2015-09-30
Organizer
Website
Exhibitors
20
Floor Size
1200
Attendees
400
Event contact first name
.
Event contact last name
Customer Service
Email
customerservice@spie.org
Event contact telephone number
+1 360 676 3290
Description
SPIE Photomask Technology, the premier event in the mask-making field, is co-located with SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Together in a single forum, this event provides access to connections and information while encouraging discussions about current research and new advancements.
Featured technologies:
+ Electron-beam lithography
+ EUV
+ Inspection and metrology tools
+ Direct laser writing
+ Optical/laser microlithography
+ Resist technology and processing
+ Electronic hardware and software
+ Electronic imaging components
AUDIENCE
+ Engineers and designers
+ Corporate managers from the industry
+ Application and product developers
+ Mask and chip designers
+ Resist chemists
+ Quality assurance specialists
+ Experts in mask infrastructure and mask integration
+ People working in emerging mask technologies
+ Microscopists from all phases of scanning microscopies
Exhibition Dates and Hours:
Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm
Wednesday 30 September | 10:00 am to 4:00 pm