SPIE Advanced Lithography Exhibition 2016

SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 40 years.
Date
2016-02-23 - 2016-02-24
Organizer
Exhibitors
50
Floor Size
5300
Attendees
2300
Event contact title
Exhibition Manager
Event contact first name
Sara
Event contact last name
Burns
Email
customerservices@spie.org
Event contact telephone number
+1 360 676 3290
Description
The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for more than 40 years. See the latest technology in advanced lithography: + Etch for nanopatterning + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, and RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Nanoscale imaging Exhibition Dates and Hours: Tuesday 23 February 2016 | 10:00 am to 5:00 pm and 6 to 8 pm (poster reception) Wednesday 24 February 2016 | 10:00 am to 4:00 pm

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