SPIE Advanced Lithography Exhibition 2015

The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers.
Date
2015-02-24 - 2015-02-25
Organizer
Exhibitors
65
Floor Size
5300
Attendees
2500
Event contact first name
0
Event contact last name
Customer Service
Email
customerservice@spie.org
Event contact telephone number
1 360 676 3290
Description

The Advanced Lithography Exhibition is a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers. SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications for 40 years. See the latest technology in advanced lithography: + Lithography: immersion, double patterning, e-beam, EUV, optical/laser, and RET + Metrology, inspection, OPC, and process control + Design and manufacturing software + Materials and chemicals + Imaging equipment + Lasers + Resist materials and processing + Nano-imprint + IC and chip fabrication + Etch for nanopatterning + Nanoscale imaging Exhibition Dates and Hours: Tuesday 24 February 2015 | 10:00 am to 5:00 pm Wednesday 25 February 2015 | 10:00 am to 4:00 pm Conferences dates: 22 February 2015 to 26 February 2015

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