SPIE Photomask Technology Exhibition 2015

SPIE Photomask Technology, the premier event in the mask-making field
Date
2015-09-29 - 2015-09-30
Organizer
Exhibitors
20
Floor Size
1200
Attendees
400
Event contact first name
.
Event contact last name
Customer Service
Email
customerservice@spie.org
Event contact telephone number
+1 360 676 3290
Description
SPIE Photomask Technology, the premier event in the mask-making field, is co-located with SPIE Scanning Microscopies, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Together in a single forum, this event provides access to connections and information while encouraging discussions about current research and new advancements. Featured technologies: + Electron-beam lithography + EUV + Inspection and metrology tools + Direct laser writing + Optical/laser microlithography + Resist technology and processing + Electronic hardware and software + Electronic imaging components AUDIENCE + Engineers and designers + Corporate managers from the industry + Application and product developers + Mask and chip designers + Resist chemists + Quality assurance specialists + Experts in mask infrastructure and mask integration + People working in emerging mask technologies + Microscopists from all phases of scanning microscopies Exhibition Dates and Hours: Tuesday 29 September | 10:00 am to 4:30 pm; 6:00 to 7:00 pm Wednesday 30 September | 10:00 am to 4:00 pm

Partner Voices

The Massachusetts Convention Center Authority’s Public Safety Team at the Boston Convention & Exhibition Center (BCEC) and the Hynes Convention Center (Hynes) have taken their experiences to develop a comprehensive crisis management and emergency preparedness training program.